Bulk-stabilized yttrium oxyfluoride might be produced from raw material powdered containing calcium fluoride (CaF 2) and yttrium o2 (YO 2) as substances. Once created, this material can be utilized as part of semiconductor manufacturing apparatuses such as vacuum chambers.
Whenever powder Yttrium Oxyfluoride is tested with Powder X-ray dispersion measurement, ideally, no CaF 2 peak should be discovered within an acceptable range that doesn’t interfere with this invention’s influence. The actual Interesting Info about yttrium oxyfluoride powder.
Yttrium(III) fluoride powdered boasts exceptional optical components in the UV, visible, and infrared spectra with wide-ranging transparency and a remarkably high refractive index. Being a white powder, it can be used across many apps, such as optical filters, glass/ceramics, high-temperature coatings, laser materials/LEDs, and so forth. Additionally, it has an orthorhombic structure, distinguished by a pair of mirror planes, which makes it suited to high-performance optical applications exactly where symmetry is essential, such as laser materials/LEDs, etc.
At conditions exceeding 500 deg M, typical yttrium oxyfluoride powdered is formed through the reaction involving YF 3 and Ymca 2 O 3, subsequently ground into fine molecule size before being blended with another raw material, for instance, yttrium oxide to form some sort of YOF/YO 2 O several composite that will dry involving 100 to 150 deg C for several hours ahead of being sprayed into molds under 65 MPa stress for pressing for up to zero. 5 minutes at 65 MPa pressure for pressing. After that, fired for 4 hrs under Ar atmosphere prior to producing sintered bodies associated with stabilized yttrium oxyfluoride sintered bodies can form.
Various techniques are available for verifying whether yttrium oxyfluoride has been stabilized. One particular approach involves powder X-ray diffraction measurements between ten and 90 degrees; absolutely no rhombohedral crystal phase top should be present, and the peak intensity at fourteen degrees must be very low, showing stabilization of YOF.
DTA measurements can also help confirm the stabilization of yttrium oxyfluoride by measuring its temperature rise rate from twenty-five degrees C to one thousand degrees C with a progressive heating rate of five degrees C. This dimension is regarded as stable when it has concluded without an endothermic peak due to transition among cubic or tetragonal as well as rhombohedral phases at the calculated temperature.
This technology provides a majority of stabilized yttrium oxyfluoride powdered suitable for coating constituent associates of semiconductor manufacturing tools, such as an etching tool. Bulk stabilized yttrium oxyfluoride can be produced by pulverizing some sintered body of yttrium oxyfluoride and subjecting its powdered to TMA measurement for a price of 5 deg M per minute. TMA measurements executed on yttrium oxyfluoride are generally non-disruptive; discontinuities due to cycle transition from cubic for you to rhombohedral are not evident throughout measurement results. Furthermore, as soon as the Yttrium Oxyfluoride was encountered with powder X-ray diffraction size with a scanning range of 2nd = 14 degrees, any peak identified with Rhombohedral YOF could be observed; zero peaks from CaF only two could be discerned.
Yttrium oxyfluoride may take the form of powder, grain, bulk materials, film elements, or dense porous clusters. Preferably, it has a crystal composition with cell parameters involving 0. 3910nm for its some sort of b and c factors, respectively, for an ideally created tetragonal system crystal framework.
Studies have demonstrated that yttrium oxyfluoride displays more excellent resistance to halogen-based plasma when used as a spraying material due to its reduced enthalpy of formation associated with metal-oxygen bonds than the competitor Y2O3. This makes YOF chemically more stable.
In addition, yttrium fluoride powder effectively inhibits compound generation in plasma aircraft. Furthermore, according to thermogravimetric evaluation, yttrium fluoride-based products can shed fluorine because of YF3 at temperatures up to 900 degrees C, making yttrium fluoride an ideal material for plasma processing applications.
Yttrium Fluoride Powder is packaged to satisfy stringent quality standards. Exterior tags and labels ensure easy identification and high-quality control during storage and transportation, and extra care is taken to prevent damage during handling or even shipping processes.
Yttrium oxyfluoride is an essential organic material in the production of sophisticated electronics and circuitry due to its outstanding insulating and signal-delaying capabilities. Furthermore, its thermal balance ensures devices continue to handle despite environmental conditions; apps for this material range from space to microelectronics.
Preparation involving yttrium oxyfluoride involves powdering calcium fluoride (CaF2). Once ground into smaller particles, this should always be combined with yttrium oxide powder derived from hydroxide or carbonate sources to produce the final merchandise, which features excessive purity, low vapor force, and excellent conductivity attributes.
On cooling from great heat, YOF undergoes a cycle transition from cubic or maybe tetragonal crystals to rhombohedral ones. This change in level may cause stress to build up in its structure, which may cause cracks or even complete inability; to ensure stability during DTA measurements, no endothermic optimum should appear during size.
A YOF-based coating part can be easily applied to just about any surface using the APS process, making it perfect for applications necessitating thin and uniform videos with superior chemical weight against acids that assault it. You can apply the actual layer using an atomizing apply gun.
YOF-based coating levels can also be created on metallic substrates using spherical yttrium compound powder deposited, possibly using vacuum deposition or even electron beam deposition techniques. This provides for an excellent relationship strength and thermal balance rating of less than 2% in terms of porosity and energy stability.
Spherical yttrium natural powder typically features a Fahrenheit content between 20% and 40% and an air content between 30% and 50%. It will be characterized using X-ray dispersion, metallographic optical microscopy, Vickers microhardness tests, or DTA. Furthermore, thermal stability may be assessed via DTA lab tests.
The present invention gifts a yttrium oxyfluoride powder snow with a highly high surface area and excellent substance resistance, capable of withstanding heat shocks and mechanical strains without succumbing to destruction. Furthermore, this yttrium oxyfluoride material can serve as a raw substance for many industrial applications, starting from bulk material production to be able to sintered bodies used since inner wall material with plasma processing apparatuses, semiconductor manufacturing apparatuses, chemical grow components, and even plasma control apparatuses themselves.
According to that invention, stabilized yttrium oxyfluoride produced is characterized by a minimal thermal expansion coefficient, substantial melting point, and excellent electrical conductivity; additionally, it owns an ideal crystal structure and has now both high density and strength properties.
As stated in the entire world invention, it is possible to produce yttrium oxyfluoride in powder and granular form by reacting it with yttrium o2. Alternatively, it can also be made into sintered body form using the solution to produce stabilized yttrium oxyfluoride. Once manufactured, this material can be employed as inner wall content in various plasma processing devices, such as vacuum chambers and sample tables. It can also be used in semiconductor manufacturing, including focus rings, sample chucks, or etching gas delivery ports in vacuum pockets.
As part of the process of producing yttrium oxyfluoride, the first raw content powder must be heated to 800 degrees C and cooled back down to just about 1700 degrees C ahead of the second raw material powdered ingredients are added and afflicted by high-pressure heating to form crystallized yttrium oxyfluoride. Once made, further purification occurs by means of heat treatment at five various deg C/minute rates of approximately 1700 deg T down to 25 deg T. This step is duplicated several times over to further filter yttrium oxyfluoride.
Once it encounters rapid cooling, yttrium oxyfluoride is stabilized through superfast cooling. Once completed, the cubic phase structure of yttrium oxyfluoride will have formed.
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